The Silicon Precursor Toolbox for Low-Temperature Deposition Protecting Your Data Center Environment from Gas-Phase Contamination Pervasive Defectivity in Semiconductor Manufacturing Holistic Approach to Enabling Device Performance, Yield, and Reliability SmartStack® Contactless Horizontal Wafer ShipperĬhemlock® Filter Housing Technical InformationĪchieving SAE J2719 Quality Hydrogen for Fuel CellsĬars and Chips: The Acceleration of Electronic Systems Plasma Enhanced Chemical Vapor Deposition (PECVD) Coatingsģ00 mm Front Opening Unified Pods (FOUPs)ġ50 mm and Smaller Wafer Carrier Accessories Storage Boxes and Individual Disk Packages The contribution due to Brownian motion is extracted by smart algorithms and used for calculation of the particle size characteristics, while the flow rate information is obtained instantaneously for every measurement as well.Wide Band Gap Semiconductor Cleaning SolutionsĪdvanced Deposition Materials (ADM) ALD/CVD PrecursorsįluoroPure® Advantage Trilayer HDPE Blowmolded DrumsįluoroPure® Trilayer HDPE Blowmolded DrumsįluoroPure® Port Options, Tools and Accessoriesįilter Housings and Stand-alone Filter Cabinets The depth resolved light scattering data holds information on particle movement caused by both Brownian motion as well as flow rate and pattern. The spatially resolved data also allows to measure and correct for flow. As a result, many nanosuspensions up to relative high concentrations or turbidity can be measured without dilution. Depth resolved data enables the effective and automatic filtering of single and multiple scattered light which results in a significantly wider accessible turbidity range compared to conventional DLS. In addition to conventional DLS intensity fluctuations are obtained simultaneously as a function of depth in the sample up to about 3mm. The interferometer part of the technology allows to resolve backscattered light for specific path lengths in the sample simultaneously. Back scattered light interferes with light split from the source with a specific optical path length. Spatially Resolved Dynamic Light Scattering is based on low coherence interferometry of backscattered broadband light (multiple wavelengths instead of a single wavelength laser). In order to overcome the limitations of conventional DLS for process analytical applications InProcess-LSP developed a new innovative technology: Spatially Resolved Dynamic Light Scattering (SR-DLS). Since nanosuspensions are in motion during processing and vary in turbidity levels conventional DLS is unsuitable for process analytical (PAT) applications. Measurements are performed non-invasively in samples as such or directly in the process through any glass interface such as a vial, a flow cell or a specific flask or container type.Ĭonventional DLS measurements need to be performed under static conditions ensuring that particle movements are solely caused by Brownian motion and not influenced by other factors like liquid flow.Īdditionally, conventional DLS cannot be applied to relative turbid suspension without dilution, while these are often encountered in industrial or process environments. In addition, high measurement frequencies of 5 to 10 seconds allow monitoring of relatively fast changing processes as well, and provide a full ‘picture’ of the particle growth process of interest. SR-DLS is capable of measuring nanoparticle size in real time in the submicron region in flowing and undiluted nanosuspensions. Spatially Resolved Dynamic Light Scattering (SR-DLS), a relatively new technology for inline, online and at-line nanoparticle size monitoring, was developed and introduced by InProcess-LSP in 2019.
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